M&R Nano Technology Co., Ltd.
mask aligners, UV light sources, photomasks, spin coaters, high sensitivity EMCCD, high resolution ( manual, semi auto) mask alignment and exposure system, both single and double side ( back side IR or back side CCD), spin coaters, hot plates, ovens, developers, etchers, wet bench, DI & megasonic water wafer cleaning systems, andor high sensitivity CCD & spectrographs, ...

Taiwan 







Others
China 



