Physical vapor deposition (PVD) is a variety of vacuum deposition methods used to deposit thin films by the condensation of a vaporized form of the desired film material onto various work piece surfaces (e.g., onto semiconductor wafers).
The coating method involves purely physical processes such as high-temperature vacuum evaporation with subsequent condensation, or plasma sputter bombardment rather than involving a chemical reaction at the surface to be coated as in chemical vapor deposition.
| Company Name : | Pan Taiwan Enterprise Co., Ltd. |
|---|---|
| Contact Person : | Ms. Sharon Lee  |
| Address : | 16F-1, NO. 16, JIAN BA ROAD, CHUNG HO DISTRICT, NEW TAIPEI CITY, 23511 TAIWAN |
| City : | NEW TAIPEI CITY |
| Province / State : | Taiwan |
| Country : |  Taiwan |
| Telephone : | 886-2-82265199 |
| Fax : | 886-2-82265196 |
